Quick ellipsometric technique for determining the thicknesses and optical constant profiles of Fe/SiO2/Si(100) nanostructures during growth

Описание

Тип публикации: статья из журнала

Год издания: 2012

Идентификатор DOI: 10.1134/S1063784212090241

Аннотация: An algorithm is developed to perform rapid control of the thickness and optical constants of a film structure during growth. This algorithm is tested on Fe/SiO2/Si(100) structures grown in an Angara molecular-beam epitaxy setup. The film thicknesses determined during their growth are compared with X-ray spectral fluorescence analysПоказать полностьюis and transmission electron microscopy data.

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Издание

Журнал: TECHNICAL PHYSICS

Выпуск журнала: Vol. 57, Is. 9

Номера страниц: 1225-1229

ISSN журнала: 10637842

Место издания: NEW YORK

Издатель: MAIK NAUKA/INTERPERIODICA/SPRINGER

Персоны

  • Tarasov I.A. (Reshetnev Siberian State Aerospace University)
  • Kosyrev N.N. (Reshetnev Siberian State Aerospace University)
  • Varnakov S.N. (Reshetnev Siberian State Aerospace University)
  • Ovchinnikov S.G. (Kirenskii Institute of Physics, Siberian Branch,Russian Academy of Sciences)
  • Zharkov S.M. (Siberian Federal University)
  • Bondarenko S.G. (Kirenskii Institute of Physics, Siberian Branch,Russian Academy of Sciences)
  • Shvets V.A. (Novosibirsk State University)
  • Tereshchenko O.E. (Institute of Semiconductor Physics, Siberian Branch,Russian Academy of Sciences)

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