Electric properties of single-crystalline nickel films deposited by the method of chemical transport reactions

Описание

Тип публикации: статья из журнала

Год издания: 1986

Идентификатор DOI: 10.1007/BF00892992

Ключевые слова: CHEMICAL REACTIONS, CRYSTALS - Growing, FILMS - Electric Properties, CHEMICAL TRANSPORT REACTIONS, SINGLE-CRYSTALLINE NICKEL FILMS, NICKEL AND ALLOYS

Аннотация: The conditions for obtaining single-crystalline nickel films with a high resistivity ratio at room temperature and at 4.2 K (up to 1000) are described. The thicknesses of the films studied fall in the range 0.7-10 ?m. The meanfree path length of the carriers (6-7 ?m) and the specularity parameter (0.05) are determined using the FukПоказать полностьюs-Sondheimer method. Р’В© 1986 Plenum Publishing Corporation.

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Издание

Журнал: Soviet Physics Journal

Выпуск журнала: Vol. 29, Is. 4

Номера страниц: 259-262

Персоны

  • Kiselev N.I. (Krasnoyarsk Polytechnical Institute, Russia)
  • Kan S.V. (Krasnoyarsk Polytechnical Institute, Russia)
  • Pyn'ko V.G. (Krasnoyarsk Polytechnical Institute, Russia)
  • Babkin E.V. (Krasnoyarsk Polytechnical Institute, Russia)

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