Тип публикации: статья из журнала
Год издания: 2020
Идентификатор DOI: 10.1134/S1063783420040034
Ключевые слова: Al/Ag, electron diffraction, phase formation, resistivity, solid-state reaction, thin films
Аннотация: Based on the results of in situ electron diffraction study of the solid-state reaction and electrical resistivity measurements on the Al/Ag thin films with an atomic ratio of Al : Ag = 1 : 3, the temperature of the reaction onset has been established and a model of the structural phase transitions has been proposed. The solid-stateПоказать полностьюreaction begins at 70°C with the formation of the Al–Ag solid solution at the interface between the aluminum and silver nanolayers. It has been found that, in the course of the reaction, the intermetallic compounds γ-Ag2Al → μ-Ag3Al are successively formed. It is shown that the possibility of the formation of the μ‑Ag3Al phase during the solid-state reaction in the Al/Ag thin films depends on the aluminum-to-silver ratio, while the formation of the μ-Ag3Al phase begins only after all fcc aluminum has reacted. © 2020, Pleiades Publishing, Ltd.
Журнал: Physics of the Solid State
Выпуск журнала: Vol. 62, Is. 4
Номера страниц: 708-713
ISSN журнала: 10637834
Издатель: Pleiades Publishing