Plasma-Chemical Method of Silicon Carbide Modification to Obtain Particles with Controlled Surface Morphology : научное издание

Описание

Тип публикации: статья из журнала

Год издания: 2024

Идентификатор DOI: 10.1134/S1063785023180189

Ключевые слова: silicon carbide, plasma chemistry, surface morphology, nanoparticles, nanowires, carbon shell, core-shell

Аннотация: A plasma-chemical method for the modification of silicon carbide particles is presented, which makes it possible to obtain particles with a controlled surface morphology. The variable parameter of particle processing was the ratio of the fraction of plasma-forming (Ar) and additional (H) gases. It was shown that at Ar/H = 100/0, thПоказать полностьюe formation of a carbon shell is observed; at Ar/H ratios of 91/9 and 84/16, the particles are characterized by a carbon shell decorated with silicon nanoparticles or nanowires, respectively. The modified particles were analyzed using scanning electron microscopy and Raman spectroscopy.

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Издание

Журнал: Technical Physics Letters

Выпуск журнала: Т.50, 2

Номера страниц: 239-243

ISSN журнала: 10637850

Место издания: Санкт-Петербург

Издатель: Pleiades Publishing, Ltd. (Плеадес Паблишинг, Лтд)

Персоны

  • Shalygina T.A. (Siberian Federal University)
  • Rudenko M.S. (Reshetnev Siberian State Aerospace University)
  • Nemtsev I.V. (Kirensky Institute of Physics, Federal Research Center KSC SB, Russian Academy of Sciences)
  • Parfenov V.A. (Institute of Chemistry and Chemical Technology, Federal Research Center KSC SB RAS, Russian Academy of Sciences)

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