Тип публикации: статья из журнала
Год издания: 2019
Идентификатор DOI: 10.1088/1361-6641/ab0327
Ключевые слова: spin accumulation, interface states, hybrid structures, Hanle effect, iron silicide
Аннотация: Spin accumulation effect in Fe3Si/p-Si structure with low boron doped silicon substrate was found. Calculated spin lifetimes are comparable with results reported earlier but for structures with highly doped semiconductors (SC) with or without a tunnel bar Spin accumulation effect in Fe 3 Si/p-Si structure with low boron doped silicПоказать полностьюon substrate was found. Calculated spin lifetimes are comparable with results reported earlier but for structures with highly doped semiconductors (SC) with or without a tunnel b
Журнал: SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Выпуск журнала: Vol. 34, Is. 3
Номера страниц: 35024
ISSN журнала: 02681242
Место издания: BRISTOL
Издатель: IOP PUBLISHING LTD