Тип публикации: статья из журнала
Год издания: 2022
Идентификатор DOI: 10.21883/pss.2022.14.54350.139
Аннотация: <jats:p> The study of the formation of the Cu<jats:sub>6</jats:sub>Sn<jats:sub>5</jats:sub> intermetallic compound in Sn(55 nm)/Cu(30 nm) thin bilayer films was carried out directly in the column of a transmission electron microscope (electron diffraction mode) by heating the film sample from room temperature to 300<jats:sup>o</jatПоказать полностьюs:sup>C and recording the electron diffraction patterns. The thin films formed as a result of a solid state reaction were monophase and consisted of the eta-Cu<jats:sub>6</jats:sub>Sn<jats:sub>5</jats:sub> hexagonal phase. The temperature range for the formation of the eta-Cu<jats:sub>6</jats:sub>Sn<jats:sub>5</jats:sub> phase was determined. The estimate of the effective interdiffusion coefficient of the reaction suggests that the main mechanism for the formation of the Cu<jats:sub>6</jats:sub>Sn<jats:sub>5</jats:sub> intermetallic is diffusion along the grain boundaries and dislocations. Keywords: thin films, Cu<jats:sub>6</jats:sub>Sn<jats:sub>5</jats:sub> intermetallic compound, transmission electron microscopy, electron diffraction. </jats:p>
Журнал: Physics of the Solid State
Выпуск журнала: Т.64, №14
Номера страниц: 2456
ISSN журнала: 10637834
Издатель: Ioffe Institute Russian Academy of Sciences