Plasma-chemical method of silicon carbide modification to obtain particles with controlled surface morphology : научное издание

Описание

Тип публикации: статья из журнала

Год издания: 2022

Идентификатор DOI: 10.21883/tpl.2022.02.53582.19042

Аннотация: <jats:p> A plasma-chemical method for the modification of silicon carbide particles is presented, which makes it possible to obtain particles with a controlled surface morphology. The variable parameter of particle processing was the ratio of the fraction of plasma-forming (Ar) and additional (H) gases. It was shown that at Ar/H = Показать полностью100/0, the formation of a carbon shell is observed; at Ar/H ratios of 91/9 and 84/16, the particles are characterized by a carbon shell decorated with silicon nanoparticles or nanowires, respectively. The modified particles were analyzed using scanning electron microscopy and Raman spectroscopy. Keywords: silicon carbide, plasma chemistry, surface morphology, nanoparticles, nanowires, carbon shell, core-shell </jats:p>

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Издание

Журнал: Technical Physics Letters

Выпуск журнала: Т. 48, 2

Номера страниц: 58

ISSN журнала: 10637850

Издатель: Ioffe Institute Russian Academy of Sciences

Персоны

  • Shalygina T. A. (Siberian Federal University, Krasnoyarsk, Russia)
  • Rudenko M. S. (Reshetnev Siberian State Aerospace University, Krasnoyarsk, Russia)
  • Nemtsev I. V. (Kirensky Institute of Physics, Federal Research Center KSC SB, Russian Academy of Sciences, Krasnoyarsk, Russia)
  • Parfenov V. A. (Institute of Chemistry and Chemical Technology, Federal Research Center KSC SB RAS, Russian Academy of Sciences, Krasnoyarsk, Russia)
  • Voronina S. Yu. (Reshetnev Siberian State Aerospace University, Krasnoyarsk, Russia)

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