Effect of quenching rate on crystalline and impedance properties of NiO nanoparticles

Описание

Тип публикации: статья из журнала

Год издания: 2020

Идентификатор DOI: 10.1109/TDEI.2020.009110

Ключевые слова: dielectric constant, double electric layer, impedance spectroscopy, nanopowder, nickel oxide, proton-ion conductivity

Аннотация: NiO nanopowder is produced through plasma-chemical synthesis in a low-pressure arc reactor in an atmosphere of 80% Ar + 20% O2 at a pressure of 40 (sample 1) and 180 Pa (sample 2). The crystalline, morphological, and impedance properties are studied by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroПоказать полностьюscopy, and impedance spectroscopy. It is shown that an increase in pressure leads to the synthesis of nanomaterials with fundamentally different crystalline and electrical properties. Sample 1 shows a non-stoichiometric composition (Ni42O58), a face-centered cubic lattice, and a size of coherent scattering regions (CSR) of 16 nm. The impedance studies shows that the frequency dependences are well described by the Debye relaxation model, at low frequencies the real part of the dielectric constant is equal to 35, and thermal studies show a negative temperature coefficient of resistance (NTCR). Sample 2 has an amorphous structure, almost stoichiometric composition (Ni48O52). At low frequencies, the real and imaginary parts of the dielectric constant reaches 105. The anomaly is explained by the formation of a double electric layer near the electrodes due to proton-ion conductivity. © 1994-2012 IEEE.

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Издание

Журнал: IEEE Transactions on Dielectrics and Electrical Insulation

Выпуск журнала: Vol. 27, Is. 5

Номера страниц: 1486-1491

ISSN журнала: 10709878

Издатель: Institute of Electrical and Electronics Engineers Inc.

Персоны

  • Ushakov A.V. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia; RAS, Siberian Branch, Krasnoyarsk Sci Ctr, Fed Res Ctr, 50 Akademgorodok, Krasnoyarsk 660036, Russia)
  • Karpov I.V. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia)
  • Fedorov L.Yu. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia)
  • Demin V.G. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia)
  • Zeer G.M. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia)
  • Goncharova E.A. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia)
  • Ushakov A.V. (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia; RAS, Siberian Branch, Krasnoyarsk Sci Ctr, Fed Res Ctr, 50 Akademgorodok, Krasnoyarsk 660036, Russia)
  • Fedorov L.Yu (Siberian Fed Univ, 79 Svobodny Pr, Krasnoyarsk 660079, Russia; RAS, Siberian Branch, Krasnoyarsk Sci Ctr, Fed Res Ctr, 50 Akademgorodok, Krasnoyarsk 660036, Russia)