Тип публикации: статья из журнала
Год издания: 2015
Идентификатор DOI: 10.1134/S1061934815070072
Ключевые слова: adsorption, chemically modified silicas, sulfur-containing groups, osmium, Gas adsorption, Gases, Silica, Sulfur, Certified reference materials, Chemically modified, Diffuse reflection spectroscopy, Dithiocarbamates, Hydrochloric acid solution, Photometric determinations, Pre-concentration, Sulfur determination
Аннотация: The adsorption of osmium(VIII) from sulfuric and hydrochloric acid solutions and gas phase on silicas chemically modified by dithiocarbamate, thiodiazolthiol, mercaptophenylpropylurea, and aminobenzothiazolpropyl groups is studied. A procedure is developed for the adsorption-photometric determination of osmium, including the adsorpПоказать полностьюtion of osmium(VIII) from the gas phase on silicas chemically modified by sulfur-containing groups and the determination of osmium in the adsorbent phase by diffuse reflection spectroscopy. The procedure was used to determine osmium in a certified reference material of the composition of a matte ore thermal melting and process waters.
Журнал: JOURNAL OF ANALYTICAL CHEMISTRY
Выпуск журнала: Vol. 70, Is. 7
Номера страниц: 781-787
ISSN журнала: 10619348
Место издания: NEW YORK
Издатель: MAIK NAUKA/INTERPERIODICA/SPRINGER