Тип публикации: статья из журнала
Год издания: 2017
Идентификатор DOI: 10.1007/s12668-017-0419-x
Ключевые слова: Avena sativa L, Lodging resistance, Medicago sativa L, Microbial community of rhizosphere, Morphometric parameters of plants, Photosynthetic pigments, Silicon oxide nanoparticlescellulose, 61991-22-8, 68073-05-2, 9004-34-6, phosphate, 14066-19-4, 14265-44-2, silicon dioxide, 10279-57-9, 14464-46-1, 14808-60-7, 15468-32-3, 60676-86-0, 7631-86-9
Аннотация: Using a field small-plot experiment, the influence of pre-sowing seed treatment of monocotyledons and dicotyledons, namely hulless oat (Avena sativa L.) and lucerne (Medicago sativa L. subsp. varia (Martyn) Arcang.), with suspensions of silicon oxide (SiO2) nanoparticles in different concentrations on morphometric parameters and miПоказать полностьюcrobial cenosis of their rhizosphere was studied. It has been found that spraying of seeds with 3 × 10−5 and 3 × 10−4% suspensions of SiO2 nanoparticles accelerates the growth, and development of oat and lucerne increases the content of photosynthetic pigments in leaves and contributes to 30–40% decrease in height of an oat straw and size reduction of internodes, while increasing the specific weight of a plant by 26–38%. These findings demonstrate a higher lodging resistance of plants. In general, the monocotyledonous crop Avena sativa L. has a stronger physiological response to seed treatment with a suspension of nanoparticles than the dicotyledonous crop Medicago sativa L. The pre-sowing seed treatment of oat and lucerne induced changes in the microbial community of their rhizospheres: on the one hand, it increased proportions of nitrifying and phosphate mobilizing bacteria, as well as cellulose-decomposing actinomycetes; on the other hand, it reduced population density of microscopic fungi, while increasing a taxonomic diversity of soil fungi. In general, these findings demonstrate the improved environmental situation in rhizospheres of plants and reduced risk of root rot. © 2017, Springer Science+Business Media New York.
Журнал: BioNanoScience
Выпуск журнала: Vol. 7, Is. 4
Номера страниц: 703-711
ISSN журнала: 21911630
Издатель: Springer New York LLC