Тип публикации: статья из журнала
Год издания: 2012
Идентификатор DOI: 10.1134/S0036024412070138
Ключевые слова: silicon carbide, defects, adatoms, density functional method, Carbon ad-atoms, Density-functional methods, Homoepitaxial growth, Low qualities, Material property, Structural defect, Epitaxial growth, Monolayers, Vacancies
Аннотация: It is noted that the development of semiconductor SiC-electronics is prevented by a low quality of grown silicon carbide single crystals. It is found that structural defects of a substrate penetrating into an epitaxial layer upon subsequent homoepitaxial growth can considerably degrade a device's characteristics. We investigate theПоказать полностьюeffect of the deformation of a hexagonal SiC monolayer on vacancy stability and material properties, and study the processes of silicon and carbon adatom migration over a surface of SiC.
Журнал: RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY A
Выпуск журнала: Vol. 86, Is. 7
Номера страниц: 1091-1095
ISSN журнала: 00360244
Место издания: NEW YORK
Издатель: MAIK NAUKA/INTERPERIODICA/SPRINGER