Тип публикации: статья из журнала
Год издания: 2015
Идентификатор DOI: 10.1134/S1063782615040211
Аннотация: The electroluminescence efficiency of silicon light-emitting diode structures with several layers of ?-FeSi<inf>2</inf> nanocrystallites embedded in the p-n junction is investigated. The nanocrystallites were formed by either solid-phase epitaxy or a combination of reactive and solid-phase epitaxy. For the structures in which the nПоказать полностьюanocrystallites were formed by the combined method, electroluminescence is observed only at low temperatures (below 70K). This is indicative of a high concentration of defects acting as nonradiative-recombination centers. For the structures with nanocrystallites formed by solid-phase epitaxy, intense electroluminescence is observed up to room temperature. The dependence of the electroluminescence intensity on the size of the nanocrystallites is studied. © 2015, Pleiades Publishing, Ltd.
Журнал: Semiconductors
Выпуск журнала: Vol. 49, Is. 4
Номера страниц: 508-512