Тип публикации: статья из журнала

Год издания: 2021

Идентификатор DOI: 10.1021/acsami.1c08036

Ключевые слова: atomic layer deposition, titanium oxynitride, copper doping, surface segregation, thin film

Аннотация: Copper-doped titanium oxynitride (TiNxOy) thin films were grown by atomic layer deposition (ALD) using the TiCl4 precursor, NH3 , and O-2 at 420 degrees C. Forming gas was used to reduce the background oxygen concentration and to transfer the copper atoms

Журнал: ACS APPLIED MATERIALS & INTERFACES

Выпуск журнала: Vol. 13, Is. 27

Номера страниц: 32531-32541

ISSN журнала: 19448244

Место издания: WASHINGTON

Издатель: AMER CHEMICAL SOC

• Baron Filipp A. (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Mikhlin Yurii L. (KSC SB RAS, Inst Chem & Chem Technol, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Molokeev Maxim S. (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia; Siberian Fed Univ, Krasnoyarsk 660041, Russia)
• Rautskiy Mikhail (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Tarasov Ivan A. (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Volochaev Mikhail N. (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Shanidze Lev (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia)
• Lukyanenko Anna (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia; Siberian Fed Univ, Krasnoyarsk 660041, Russia)
• Smolyarova Tatiana E. (KSC SB RAS, Kirensky Inst Phys, Fed Res Ctr, Krasnoyarsk 660036, Russia; Siberian Fed Univ, Krasnoyarsk 660041, Russia)
• Konovalov Stepan O. (Reshetnev Siberian State Univ Sci & Technol, Krasnoyarsk 660037, Russia)
• Zelenov Fyodor (Reshetnev Siberian State Univ Sci & Technol, Krasnoyarsk 660037, Russia)
• Tarasov Anton S.
• Volkov Nik

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