Grafting of carboxyl groups using CO2/C2H4/Ar pulsed plasma: Theoretical modeling and XPS derivatization

Описание

Тип публикации: статья из журнала

Год издания: 2018

Идентификатор DOI: 10.1016/j.apsusc.2017.11.174

Ключевые слова: Carboxyl functionalization, Derivatization, Modeling, Plasma deposition, XPS

Аннотация: The grafting of carboxyl groups enhances cell adhesion and can be used for immobilization of different biomolecules onto plasma-treated materials. The process, however, was not well optimized due to lack of clear understanding of the mechanisms of carboxylic group incorporation into plasma and their grafting to polymer surface. In Показать полностьюthis work the deposition of COOH plasma polymers from CO2/C2H4/Ar pulsed discharge has been studied depending on the gas mixture and duty cycle. We have demonstrated that the CO2/C2H4/Ar plasma with adjustable thickness of COOH functionalized layer and high stability of the grafted functions in water is a better solution for the COOH surface functionalization compared to the thoroughly analyzed CO2 plasma. The concentration of different carbon environments and the density of COOH groups have been measured by using chemical derivatization combined with X-ray photoelectron spectroscopy. It has been found that the CO2/C2H4/Ar plasma mainly contains ester groups (COOC), the COOH/COOC ratio being between 0.03 and 0.08. The water stability of the COOH groups was significantly higher compared to ester environment, so immersing in water for 24 h allowed to increase the COOH/COOC ratio by a factor of 3. The mechanisms of the CO2 molecule attachment to hydrocarbon chains on the polymer surface and those located inside the plasma were modeled using ab initio calculations. © 2017 Elsevier B.V.

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Издание

Журнал: Applied Surface Science

Выпуск журнала: Vol. 435

Номера страниц: 1220-1227

Издатель: Elsevier B.V.

Авторы

  • Manakhov A. (National University of Science and Technology “MISiS”, Leninsky pr. 4, Moscow, Russian Federation)
  • Kiryukhantsev-Korneev P. (National University of Science and Technology “MISiS”, Leninsky pr. 4, Moscow, Russian Federation)
  • Michlíček M. (RG Plasma Technologies, CEITEC – Central European Institute of Technology, Masaryk University, Purkyňova 123, Brno, Czech Republic, Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, Brno, Czech Republic)
  • Permyakova E. (National University of Science and Technology “MISiS”, Leninsky pr. 4, Moscow, Russian Federation)
  • Dvořáková E. (RG Plasma Technologies, CEITEC – Central European Institute of Technology, Masaryk University, Purkyňova 123, Brno, Czech Republic, Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, Brno, Czech Republic)
  • Polčák J. (CEITEC - Central European Institute of Technology, Brno University of Technology, Purkyňova 123, Brno, Czech Republic)
  • Popov Z. (National University of Science and Technology “MISiS”, Leninsky pr. 4, Moscow, Russian Federation)
  • Visotin M. (Siberian Federal University, 79 Svobodny av., Krasnoyarsk, Russian Federation, Federal Research Center KSC SB RAS, 50/38 Akademgorodok, Krasnoyarsk, Russian Federation)
  • Shtansky D.V. (National University of Science and Technology “MISiS”, Leninsky pr. 4, Moscow, Russian Federation)

Вхождение в базы данных

  • Scopus (цитирований 1)